Universal Scaling Laws in Schottky Heterostructures Based on Two-Dimensional Materials

被引:144
作者
Ang, Yee Sin [1 ]
Yang, Hui Ying
Ang, L. K. [1 ]
机构
[1] SUTD, SUTD MIT Int Design Ctr, 8 Somapah Rd, Singapore 487372, Singapore
关键词
P-N-JUNCTIONS; GRAPHENE; MOS2; CONTACTS; DIODES; SEMICONDUCTORS; TRANSISTORS; EMISSION;
D O I
10.1103/PhysRevLett.121.056802
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We identify a new universality in the carrier transport of two-dimensional (2D) material-based Schottky heterostructures. We show that the reversed saturation current (J) scales universally with temperature (T) as log(J/T beta) proportional to -1/T, with beta = 3/2 for lateral Schottky heterostructures and beta = 1 for vertical Schottky heterostructures, over a wide range of 2D systems including nonrelativistic electron gas, Rashba spintronic systems, single-and few-layer graphene, transition metal dichalcogenides, and thin films of topological solids. Such universalities originate from the strong coupling between the thermionic process and the in-plane carrier dynamics. Our model resolves some of the conflicting results from prior works and is in agreement with recent experiments. The universal scaling laws signal the breakdown of beta = 2 scaling in the classic diode equation widely used over the past sixty years. Our findings shall provide a simple analytical scaling for the extraction of the Schottky barrier height in 2D material-based heterostructures, thus paving the way for both a fundamental understanding of nanoscale interface physics and applied device engineering.
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页数:7
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