Why the Universal Mobility Is Not

被引:28
作者
Cristoloveanu, Sorin [1 ]
Rodriguez, Noel [2 ]
Gamiz, Francisco [2 ]
机构
[1] Inst Microelect Electromagnetisme & Photon Minate, F-38016 Grenoble, France
[2] Univ Granada, Dept Elect, E-18071 Granada, Spain
关键词
Carrier mobility; effective field; silicon-on-insulator (SOI) metal-oxide-semiconductor field-effect transistors (MOSFETs); ultrathin silicon films; universal mobility; INVERSION LAYER MOBILITY; ELECTRON-MOBILITY; SOI-MOSFETS; OXYGEN IMPLANTATION; CHANNEL MOBILITY; SI MOSFETS; GATE; TEMPERATURE; FILMS; TRANSISTORS;
D O I
10.1109/TED.2010.2046109
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Examples taken from ultrathin silicon-on-insulator (SOI) transistors tend to contradict the universality of mobility-field dependence. We revisit the meaning of the effective field concept and its implications on the universal mobility curve (UMC). Poisson-Schroedinger simulations point out the inappropriateness of the standard definitions of effective field when dealing with SOI or double-gate devices. Different carrier distributions can lead to the same value of the effective field breaking the foundation of the universality. The presence of two different gate stacks, the coexistence and coupling of two channels, and the spreading of carriers in the body are interesting nonlocal effects that are not accounted for by the UMC. Selected practical results showing the UMC failure in SOI metal-oxide-semiconductor field-effect transistors are presented. The actual behavior of the effective mobility is illustrated, shedding light on the limitations of the universal mobility/effective field representation.
引用
收藏
页码:1327 / 1333
页数:7
相关论文
共 24 条
[1]   A SEMIEMPIRICAL MODEL OF THE MOSFET INVERSION LAYER MOBILITY FOR LOW-TEMPERATURE OPERATION [J].
ARORA, ND ;
GILDENBLAT, GS .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1987, 34 (01) :89-93
[2]   Method for extraction of η parameter characterising μeff against Eeff curves in FD-SOI Si MOS devices [J].
Bennamane, K. ;
Ghibaudo, G. ;
Benfdila, A. .
ELECTRONICS LETTERS, 2009, 45 (12) :656-U23
[3]   TEMPERATURE-DEPENDENCE AND NON-UNIFORMITY OF ELECTRICAL-PROPERTIES OF SOI FILMS OBTAINED BY OXYGEN IMPLANTATION [J].
CRISTOLOVEANU, S ;
WYNCOLL, J ;
SPINELLI, P ;
HEMMENT, PLF ;
ARROWSMITH, RP .
PHYSICA B & C, 1985, 129 (1-3) :249-254
[4]   PROFILING OF INHOMOGENEOUS CARRIER TRANSPORT-PROPERTIES WITH THE INFLUENCE OF TEMPERATURE IN SILICON-ON-INSULATOR FILMS FORMED BY OXYGEN IMPLANTATION [J].
CRISTOLOVEANU, S ;
LEE, JH ;
PUMFREY, J ;
DAVIS, JR ;
ARROWSMITH, RP ;
HEMMENT, PLF .
JOURNAL OF APPLIED PHYSICS, 1986, 60 (09) :3199-3203
[5]  
Cristoloveanu S., 1995, ELECT CHARACTERIZATI
[6]   Ultra-thin fully-depleted SOI MOSFETs: Special charge properties and coupling effects [J].
Eminente, S. ;
Cristoloveanu, S. ;
Clerc, R. ;
Ohata, A. ;
Ghibaudo, G. .
SOLID-STATE ELECTRONICS, 2007, 51 (02) :239-244
[7]   ON THE UNIVERSAL ELECTRIC-FIELD DEPENDENCE OF THE ELECTRON AND HOLE EFFECTIVE MOBILITY IN MOS INVERSION-LAYERS [J].
EMRANI, A ;
GHIBAUDO, G ;
BALESTRA, F .
SOLID-STATE ELECTRONICS, 1994, 37 (01) :111-113
[8]   An experimental study of mobility enhancement in ultrathin SOI transistors operated in double-gate mode [J].
Esseni, D ;
Mastrapasqua, M ;
Celler, GK ;
Fiegna, C ;
Selmi, L ;
Sangiorgi, E .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2003, 50 (03) :802-808
[9]  
Esseni D., 2001, International Electron Devices Meeting (IEDM), P445
[10]   Electron mobility in double gate silicon on insulator transistors:: Symmetric-gate versus asymmetric-gate configuration [J].
Gámiz, F ;
Roldán, JB ;
Godoy, A ;
Cartujo-Cassinello, P ;
Carceller, JE .
JOURNAL OF APPLIED PHYSICS, 2003, 94 (09) :5732-5741