Acid-base properties of passive films on aluminum II. An X-ray photoelectron spectroscopy and X-ray absorption near edge structure study

被引:17
作者
Lopez, S [1 ]
Petit, JP
Tourillon, G
Dunlop, HM
Butruille, JR
机构
[1] Inst Natl Polytech Grenoble, Lab Electrochim & Physicochim Mat & Interfaces, CNRS, UMR 5631, F-38402 St Martin Dheres, France
[2] CNRS, Cristallog Lab, F-38042 Grenoble 09, France
[3] Pechiney Ctr Rech Voreppe, F-38340 Voreppe, France
关键词
D O I
10.1149/1.1838352
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The adhesion between metals and polymers has attracted much interest in recent years due to the increasing use of metal/polymer assemblies, for example, in the fields of packaging, architecture, and automotive manufacturing. Among the parameters controlling the adhesion properties of metal/polymer systems, the acid-base properties of both materials appear to play an important role. Two methods are proposed for assessing and quantifying the acido-basicity of passive films on metals: X-ray photoelectron spectroscopy (XPS) and X-ray absorption near edge structure (XANES). These techniques were used here to characterize the acid-base properties of a large set of passivated aluminum surfaces. Both XPS-monitored Fermi level shift and XANES formic acid and pyridine adsorption measurements were found in good agreement in the establishment of a relative basicity scale for the studied surfaces. Moreover, the results were cross-validated with those of the novel photoelectrochemical approach to the acid-base properties of aluminum surfaces presented in Part I.(1)
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页码:829 / 834
页数:6
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