Machining characterization of the nano-lithography process using atomic force microscopy

被引:133
作者
Fang, TH [1 ]
Weng, CI [1 ]
Chang, JG [1 ]
机构
[1] Natl Cheng Kung Univ, Dept Mech Engn, Tainan 70101, Taiwan
关键词
D O I
10.1088/0957-4484/11/3/308
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The machining characteristics of nano-lithography are studied using atomic force microscopy (AFM). Scribing (scratching) experiments containing reciprocal single line furrows and multiple furrows are conducted to investigate the influence of the working parameters on the machined surface's properties, and upon the machining efficiency. The influence of the working parameters, including the applied load on the cantilever, scribing cycles, scribing speed and scribing feed, on the surface roughness, surface depth and material removal rate can then be accessed. Results indicate that the applied load is more significant than the scribing cycles on the groove depth. However, rougher surfaces are produced at larger loads. In multiple furrows produced with larger applied loads in order to obtain deeper furrows, surface roughness is improved by adjusting the scribing feed to a small value.
引用
收藏
页码:181 / 187
页数:7
相关论文
共 13 条
  • [1] Atomic force microscope tip-induced local oxidation of silicon: Kinetics, mechanism, and nanofabrication
    Avouris, P
    Hertel, T
    Martel, R
    [J]. APPLIED PHYSICS LETTERS, 1997, 71 (02) : 285 - 287
  • [2] Basic steps of lateral manipulation of single atoms and diatomic clusters with a scanning tunneling microscope tip
    Bartels, L
    Meyer, G
    Rieder, KH
    [J]. PHYSICAL REVIEW LETTERS, 1997, 79 (04) : 697 - 700
  • [3] Simulation of asperity plowing in an atomic force microscope Part I: Experimental and theoretical methods
    Hector, LG
    Schmid, SR
    [J]. WEAR, 1998, 215 (1-2) : 247 - 256
  • [4] Fabrication of silicon and metal nanowires and dots using mechanical atomic force lithography
    Hu, S
    Hamidi, A
    Altmeyer, S
    Koster, T
    Spangenberg, B
    Kurz, H
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (05): : 2822 - 2824
  • [5] JIANG ZG, 1995, WEAR, V181, P777
  • [6] Kunze U, 1999, ADV MATER, V11, P1473, DOI 10.1002/(SICI)1521-4095(199912)11:17<1473::AID-ADMA1473>3.0.CO
  • [7] 2-H
  • [8] MIYOSHI K, 1993, SURFACE DIAGNOSTICS
  • [9] Atomic force microscopy lithography as a nanodevice development technique
    Notargiacomo, A
    Foglietti, V
    Cianci, E
    Capellini, G
    Adami, M
    Faraci, P
    Evangelisti, F
    Nicolini, C
    [J]. NANOTECHNOLOGY, 1999, 10 (04) : 458 - 463
  • [10] NANOMETER-SCALE OXIDATION OF SI(100) SURFACES BY TAPPING MODE ATOMIC-FORCE MICROSCOPY
    PEREZMURANO, F
    ABADAL, G
    BARNIOL, N
    AYMERICH, X
    SERVAT, J
    GOROSTIZA, P
    SANZ, F
    [J]. JOURNAL OF APPLIED PHYSICS, 1995, 78 (11) : 6797 - 6801