Superhydrophobic, high surface area, 3-D SiO2 nanostructures through siloxane-based surface functionalization

被引：54
作者：
Tsoi, S
Fok, E
Sit, JC
Veinot, JGC [1 ]
机构：
[1] Univ Alberta, Dept Chem, Edmonton, AB T6G 2G2, Canada
[2] Univ Alberta, Dept Elect & Comp Engn, Edmonton, AB T6G 2V4, Canada
来源：
LANGMUIR | 2004年 / 20卷 / 24期
关键词：
D O I：
10.1021/la0482507
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
Superhydrophobicity of nanostructured materials was investigated using siloxane-based surface functionalization. Glancing angle deposition (GLAD) method was used for the fabrication of nanostructured thin films of isolated columner structures. All samples were treated with oxygen plasma reactive ion etching (RIE) to maximize reactivity between SiO2 pillar surfaces toward alkyltrichlorosilane reagents. The results show that the siloxane reagents penetrate into the GLAD film to form a three-dimensional network of substrates with controlled surface chemistry.
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页码：10771 / 10774
页数：4
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