Magnetic properties of thin films of samarium-cobalt alloy prepared by magnetron sputtering

被引:7
|
作者
Panchal, Gyanendra [1 ]
Gupta, Mukul [1 ]
Choudhary, R. J. [1 ]
Phase, D. M. [1 ]
机构
[1] UGC DAE Consortium Sci Res, Khandwa Rd, Indore 452001, Madhya Pradesh, India
来源
INTERNATIONAL CONFERENCE ON RECENT TRENDS IN PHYSICS 2016 (ICRTP2016) | 2016年 / 755卷
关键词
D O I
10.1088/1742-6596/755/1/012028
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We examine the magnetic properties of samarium-cobalt thin films on quartz and Si(111) substrates grown by dc magnetron sputtering. Both films are deposited on Cr buffer layer and subsequently a capping layer of Cr was also deposited. Secondary ion mass spectroscopy results reveal that Cr diffused in to Sm-Co layer. This lead to local change in magnetocrystalline anisotropy. As the result of this we observed the two coercive behaviors in magnetization of thin film.
引用
收藏
页数:4
相关论文
共 50 条
  • [1] Magnetic Interaction Intensity in Cobalt Samarium Thin Films Fabricated Using DC Magnetron Sputtering
    Erwin
    6TH INTERNATIONAL CONFERENCE ON THEORETICAL AND APPLIED PHYSICS (ICTAP), 2017, 1801
  • [2] Magnetic properties of ZnO:Cu thin films prepared by RF magnetron sputtering
    卓世异
    熊予莹
    顾敏
    半导体学报, 2009, 30 (05) : 14 - 17
  • [3] Magnetic properties of ZnO:Cu thin films prepared by RF magnetron sputtering
    Zhuo Shiyi
    Xiong Yuying
    Gu Min
    JOURNAL OF SEMICONDUCTORS, 2009, 30 (05)
  • [4] Properties of MoOx thin films prepared by magnetron sputtering
    Wang Xiao-kun
    Fang Wei-hua
    Liu Fei
    CHINESE JOURNAL OF LIQUID CRYSTALS AND DISPLAYS, 2020, 35 (03) : 211 - 218
  • [5] Microstructure and magnetic properties of epitaxial YIG thin films prepared by RF magnetron sputtering
    Long, Hehai
    Wang, Xue
    Zhu, Zeyi
    Wan, Yafan
    Wang, Xiaomeng
    Cao, Zhijie
    Lang, Lili
    Wang, Tao
    Zheng, Fu
    Ma, Li
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2024, 35 (34)
  • [6] Structural and Magnetic Properties of TiZrNi Thin Films Prepared by Magnetron Sputtering and Thermal Annealing
    Shin, Hyemin
    Choi, Soo-bin
    Lee, Ik-jae
    Yu, Chung-jong
    Kim, Jae-yong
    JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2010, 10 (11) : 7804 - 7807
  • [7] Properties of zirconia thin films prepared by reactive magnetron sputtering
    Hembram, K. P. S. S.
    Mohan Rao, G.
    MATERIALS LETTERS, 2007, 61 (02) : 502 - 505
  • [8] Effect of Sputtering Power on the Properties of TaN Thin Films Prepared by the Magnetron Sputtering
    Lu, Qinxin
    Zhang, Xiuqing
    Gu, Liangnan
    Xue, Ninghua
    2016 3RD INTERNATIONAL CONFERENCE ON SMART MATERIALS AND NANOTECHNOLOGY IN ENGINEERING (SMNE 2016), 2016, : 67 - 70
  • [9] Effects of sputtering time on the properties of ZnO thin films prepared by magnetron sputtering
    Pan, Chen
    Zhao, Zhiwei
    Wang, Chao
    2015 IEEE INTERNATIONAL VACUUM ELECTRONICS CONFERENCE (IVEC), 2015,