Atmospheric Plasma Deposition of SiO2 Films for Adhesion Promoting Layers on Titanium

被引：10

作者：

Kotte, Liliana ^{[1
]}

Haag, Jana ^{[2
]}

Mertens, Tobias ^{[2
]}

Kaskel, Stefan ^{[1
]}

机构：

[1] Fraunhofer Inst Mat & Beam Technol IWS, Dept Chem Surface & React Technol, D-01277 Dresden, Germany

[2] IW MS, Airbus Grp Innovat Dept, Dept Metall Technol & Surface Engn, D-81663 Munich, Germany

来源：

METALS | 2014年 / 4卷 / 04期

关键词：

SiO2; film; AP-PECVD; titanium alloy; adhesion layer; wedge test;

D O I：

10.3390/met4040639

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

This paper evaluates the deposition of silica layers at atmospheric pressure as a pretreatment for the structural bonding of titanium (Ti6Al4V, Ti15V3Cr3Sn3Al) in comparison to an anodizing process (NaTESi process). The SiO2 film was deposited using the LARGE plasma source, a linearly extended DC arc plasma source and applying hexamethyldisiloxane (HMDSO) as a precursor. The morphology of the surface was analyzed by means of SEM, while the characterization of the chemical composition of deposited plasma layers was done by XPS and FTIR. The long-term durability of bonded samples was evaluated by means of a wedge test in hot/wet condition. The almost stoichiometric SiO2 film features a good long-term stability and a high bonding strength compared to the films produced with the wet-chemical NaTESi process.

引用

页码：639 / 646

页数：8

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