A Complete Resistive-Open Defect Analysis for Thermally Assisted Switching MRAMs

被引:17
作者
Azevedo, Joao [1 ]
Virazel, Arnaud [1 ]
Bosio, Alberto [1 ]
Dilillo, Luigi [1 ]
Girard, Patrick [1 ]
Todri-Sanial, Aida [1 ]
Alvarez-Herault, Jeremy [2 ]
Mackay, Ken [2 ]
机构
[1] Univ Montpellier 2, CNRS, LIRMM, F-34095 Montpellier, France
[2] CROCUS Technol, F-38025 Grenoble, France
关键词
Fault modeling; nonvolatile memories (NVM); resistive-open defects; spintronics; thermally assisted switching (TAS)-MRAM; test; MODEL;
D O I
10.1109/TVLSI.2013.2294080
中图分类号
TP3 [计算技术、计算机技术];
学科分类号
0812 ;
摘要
Magnetic random access memory (MRAM) is an emerging technology with potential to become the universal on-chip memory. Among existing MRAM technologies, thermally assisted switching (TAS)-MRAM technology offers several advantages compared with other technologies: selectivity, single magnetic field, and high-integration density. In this paper, we analyze the impact of resistive-open defects on TAS-MRAM behavior. Electrical simulations were performed on a hypothetical 16 word TAS-MRAM architecture enabling any combination of read and write operations. Results show that read and write sequences may be affected by resistive-open defects that may induce single and double-cell faulty behaviors. As a next step, we will exploit the analyses results to guide the test phase by providing effective test algorithms targeting faults related to actual defects affecting TAS-MRAM architectures.
引用
收藏
页码:2326 / 2335
页数:10
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