DC Characteristics of Wide-bandgap Semiconductor Field-effect Transistors at Cryogenic Temperatures

被引:17
作者
Kim, Hyungtak [1 ]
Lim, Jongtae [1 ]
Cha, Ho-Young [1 ]
机构
[1] Hongik Univ, Sch Elect & Elect Engn, Seoul 121791, South Korea
关键词
Wide-bandgap semiconductor; Cryogenics; GaN; SiC; HFET; MESFET; ALGAN/GAN HFETS; HEMTS; HETEROSTRUCTURES; PASSIVATION; ELECTRONICS; FABRICATION; DEPENDENCE; MOBILITY; MESFETS; POWER;
D O I
10.3938/jkps.56.1523
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We investigated the characteristics of AlGaN/GaN heterostructure field-effect transistors (HFETs) and 4H-SiC metal semiconductor field-effect transistors (MESFETs) at cryogenic temperatures to evaluate potential for extreme environmental applications. AlGaN/GaN HFETs demonstrated increased output currents and a negative shift of channel pinch-off voltage as the temperature decreased from 300 K to 50 K. 4H-SiC MESFETs demonstrated dependence on temperature opposite to that of the AlGaN/GaN HFETs. The negative temperature coefficient of the output current in AlGaN/GaN HFETs is attributed to a mobility enhancement accompanying a channel resistance reduction at cryogenic temperatures. AlGaN/GaN HFETs benefit from a heterostructure without intentional doping, showing no degradation in the channel carrier density. In 4H-SiC MESFETs, the reduction in the channel carrier density due to the deactivation of channel dopants results in a positive shift of the threshold voltage, and thereby a significant degradation of the output current. Our results confirm AlGaN/GaN HFETs to be strong candidates for cryogenic applications compared to 4H-SiC MESFETs.
引用
收藏
页码:1523 / 1526
页数:4
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