4H-SiC bipolar junction transistor with high current and power density

被引:14
作者
Perez-Wurfl, I
Krutsinger, R
Torvik, JT
Van Zeghbroeck, B
机构
[1] Univ Colorado, Dept Elect & Comp Engn, Boulder, CO 80309 USA
[2] Astralux Inc, Boulder, CO 80301 USA
关键词
SiC; BJT; high current; high power; temperature dependence;
D O I
10.1016/S0038-1101(02)00199-5
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
4H silicon carbide bipolar transistors were fabricated using a double-mesa process. The devices exhibit a maximum common emitter current gain of 17.4, a maximum current density of 42 kA/cm(2) and maximum DC power dissipation density of 1.67 MW/cm(2). The current gain was measured to decrease to 65% of its room temperature value at 300 degreesC. The record high current and power density of the devices makes them attractive for high-power RF applications. (C) 2002 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:229 / 231
页数:3
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