Evolution of in-plane magnetic anisotropy in sputtered FeTaN/TaN/FeTaN sandwich films

被引:11
|
作者
Nie, HB
Ong, CK
Wang, JP
Li, ZW
机构
[1] Natl Univ Singapore, Inst Engn Sci, Ctr Supercond & Magnet Mat, Singapore 117542, Singapore
[2] Natl Univ Singapore, Dept Phys, Singapore 117542, Singapore
[3] Data Storage Inst, Singapore 117608, Singapore
[4] Natl Univ Singapore, Temasek Labs, Singapore 119260, Singapore
关键词
D O I
10.1063/1.1555365
中图分类号
O59 [应用物理学];
学科分类号
摘要
FeTaN/TaN/FeTaN sandwich films, FeTaN/TaN, and TaN/FeTaN bilayers were synthesized by using rf magnetron sputtering. The magnetic properties, crystalline structures, microstructures, and surface morphologies of the as-deposited samples were characterized using angle-resolved M-H loop tracer, VSM, XRD, TEM, AES and AFM. An evolution of the in-plane anisotropy was observed with the changing thickness of the nonmagnetic TaN interlayer in the FeTaN/TaN/FeTaN sandwiches, such as the easy-hard axis switching and the appearing of biaxial anisotropy. It is ascribed to three possible mechanisms, which are interlayer magnetic coupling, stress, and interface roughness, respectively. Interlayer coupling and stress anisotropies may be the major reasons to cause the easy-hard axis switching in the sandwiches whereas, magnetostatic and interface anisotropies may be the major reasons to cause biaxial anisotropy in the sandwiches, in which magnetostatic anisotropy is the dominant one. (C) 2003 American Institute of Physics.
引用
收藏
页码:7252 / 7254
页数:3
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