Oxidation behavior of Cr films by Nd:YAG pulsed laser

被引：12
作者：
Dong, QZ
Hu, JD
Lian, JS
Guo, ZX
Chen, JW
Chen, B
机构：
[1] Jilin Univ, Key Lab Automobile Mat, Minist Educ, Coll Mat Sci & Engn, Changchun 130025, Peoples R China
[2] State Key Lab Appl Opt, Changchun 130025, Peoples R China
来源：
SCRIPTA MATERIALIA | 2003年 / 48卷 / 09期
关键词：
photochemical processing; SEM; XRD; internal stresses; microstructure;
D O I：
10.1016/S1359-6462(02)00655-3
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Surface oxidation of Cr films by laser was studied by scanning electron microscope and X-ray diffraction. Oxide growth is homogeneous with long pulse laser (100 mus pulse duration) but it has preferred orientation along (116) with short pulse laser irradiation (100 ns pulse duration). Lattice contraction results from internal growth stresses. (C) 2003 Acta Materialia Inc. Published by Elsevier Science Ltd. All rights reserved.
引用
收藏
页码：1373 / 1377
页数：5
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