Measurement of the electrostatic edge effect in wurtzite GaN nanowires

被引:11
作者
Henning, Alex [1 ]
Klein, Benjamin [2 ]
Bertness, Kris A. [3 ]
Blanchard, Paul T. [3 ]
Sanford, Norman A. [3 ]
Rosenwaks, Yossi [1 ]
机构
[1] Tel Aviv Univ, Sch Elect Engn, Dept Phys Elect, IL-69978 Ramat Aviv, Israel
[2] Georgia Inst Technol, Sch Elect & Comp Engn, Atlanta, GA 30332 USA
[3] NIST, Phys Measurement Lab, Div 686, Boulder, CO 80305 USA
关键词
PROBE FORCE MICROSCOPY; LIGHT-EMITTING-DIODES; SURFACE;
D O I
10.1063/1.4902873
中图分类号
O59 [应用物理学];
学科分类号
摘要
The electrostatic effect of the hexagonal corner on the electronic structure in wurtzite GaN nanowires (NWs) was directly measured using Kelvin probe force microscopy (KPFM). By correlating electrostatic simulations with the measured potential difference between the nanowire face and the hexagonal vertices, the surface state concentration and band bending of GaN NWs were estimated. The surface band bending is important for an efficient design of high electron mobility transistors and for opto-electronic devices based on GaN NWs. This methodology provides a way to extract NW parameters without making assumptions concerning the electron affinity. We are taking advantage of electrostatic modeling and the high precision that KPFM offers to circumvent a major source of uncertainty in determining the surface band bending. (c) 2014 AIP Publishing LLC.
引用
收藏
页数:5
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