Large enhancement of anisotropic magnetoresistance and thermal stability in Ta/NiFe/Ta trilayers with interfacial Pt addition

被引：41

作者：

Liu, Y. F. ^{[1
]}

Cai, J. W. ^{[1
]}

Sun, L. ^{[2
]}

机构：

[1] Chinese Acad Sci, Inst Phys, Beijing Natl Lab Condensed Matter Phys, Beijing 100190, Peoples R China

[2] Univ Houston, Dept Mech Engn, Houston, TX 77204 USA

来源：

APPLIED PHYSICS LETTERS | 2010年 / 96卷 / 09期

关键词：

annealing; chemical interdiffusion; enhanced magnetoresistance; ferromagnetic materials; iron alloys; magnetic moments; magnetic multilayers; magnetic thin films; metallic thin films; nickel alloys; platinum; spin-orbit interactions; tantalum; thermal stability; MAGNETIC-ANISOTROPY; THIN-FILMS; PERMALLOY; MULTILAYERS; THICKNESS; NI81FE19;

D O I：

10.1063/1.3334720

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Ta/NiFe/Ta trilayers, extensively used for anisotropic magnetoresistance (AMR) sensors, exhibit severely reduced MR ratio at small NiFe thickness and appreciable moment loss, especially after annealing. By inserting ultrathin Pt layers at the interfaces of the trilayers, AMR can be significantly enhanced for thin NiFe films due to the strong electron spin-orbit scattering at Pt/NiFe interfaces along with suppression of interfacial magnetic dead layers. Furthermore, the Pt layers also reduce Ta and NiFe interdiffusion and result in negligible moment loss and AMR degradation after annealing at 350 degrees C.

引用

页数：3

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