Multi-carrier transport in ZrTe5 film

被引:13
|
作者
Tang, Fangdong [1 ,2 ,3 ]
Wang, Peipei [3 ]
Wang, Peng [3 ]
Gan, Yuan [3 ]
Wang, Le [1 ,2 ]
Zhang, Wei [1 ,2 ]
Zhang, Liyuan [3 ]
机构
[1] Renmin Univ China, Dept Phys, Beijing 100872, Peoples R China
[2] Renmin Univ China, Beijing Key Lab Optoelect Funct Natual Mat & Mico, Beijing 100872, Peoples R China
[3] Southern Univ Sci & Technol, Dept Phys, Shenzhen 518055, Peoples R China
关键词
multi-carrier transport; ZrTe5; film; thickness-dependence; gate-dependence; BERRYS PHASE; HALL; SURFACE; MOBILITY; STATE;
D O I
10.1088/1674-1056/27/8/087307
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Single-layered zirconium pentatelluride (ZrTe5) has been predicted to be a large-gap two-dimensional (2D) topological insulator, which has attracted particular attention in topological phase transitions and potential device applications. Herein, we investigated the transport properties in ZrTe5 films as a function of thickness, ranging from a few nm to several hundred nm. We determined that the temperature of the resistivity anomaly peak (T-p) tends to increase as the thickness decreases. Moreover, at a critical thickness of similar to 40 nm, the dominating carriers in the films change from n-type to p-type. A comprehensive investigation of Shubnikov-de Hass (SdH) oscillations and Hall resistance at variable temperatures revealed a multi-carrier transport tendency in the thin films. We determined the carrier densities and mobilities of two majority carriers using the simplified two-carrier model. The electron carriers can be attributed to the Dirac band with a non-trivial Berry phase pi, while the hole carriers may originate from surface chemical reaction or unintentional doping during the microfabrication process. It is necessary to encapsulate the ZrTe5 film in an inert or vacuum environment to potentially achieve a substantial improvement in device quality.
引用
收藏
页数:7
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