Cost model for commercial plasma source ion implantation

A spreadsheet based cost model was used to explore the installation and operating costs for a PSII system based on various operating conditions and equipment configurations. It was found that plasma density and implantation voltage were operating specifications which can significantly affect capital costs. The plasma density is an important factor since operating at lower plasma density levels requires larger vacuum chambers and pump systems which significantly increase capital costs. Comparisons of the cost efficiency of operating at relatively high versus low implantation voltages were made. Results indicated that high dosage levels favor a higher implant voltage whereas high plasma densities favor a lower voltage, with the plasma density being the dominant factor. When capital expenses are amortized, the cost of operation comprises the majority of total annual costs, with personnel expenses being the most significant of these. Therefore, any cost comparisons with other technologies should emphasize the number and expertise (salary) of personnel. (C) 1998 Elsevier Science S.A.