Interspinous process devices in the lumbar spine

被引:101
作者
Bono, Christopher M.
Vaccaro, Alexander R.
机构
[1] Brigham & Womens Hosp, Orthopaed Spine Serv, Dept Orthopaed Surg, Boston, MA 02115 USA
[2] Harvard Univ, Sch Med, Dept Orthopaed Surg, Boston, MA USA
[3] Thomas Jefferson Univ, Rothman Inst, Dept Orthopaed Surg, Philadelphia, PA 19107 USA
来源
JOURNAL OF SPINAL DISORDERS & TECHNIQUES | 2007年 / 20卷 / 03期
关键词
interspinous spacer; interspinous process device; posterior distraction; spinal stenosis; lumbar spine;
D O I
10.1097/BSD.0b013e3180331352
中图分类号
R74 [神经病学与精神病学];
学科分类号
摘要
A growing number of interspinous process devices have been introduced to the lumbar spine implant market. Implant designs vary from static spacers to dynamized devices. Furthermore, they are composed of a range of different materials including bone allograft, titanium, polyetheretherketone, and elastomeric compounds. The common link between them is the mechanical goal of distracting the spinous processes to affect the intervertebral relationship. In contrast, the purported clinical goals are more variable, ranging from treatment of degenerative spinal stenosis, discogenic low back pain, facet syndrome, disk herniations, and instability. Though some clinical data exist for some of these devices, defining the indications for these minimally invasive procedures will be crucial. Indications should emerge from thoughtful consideration of data from randomized controlled studies.
引用
收藏
页码:255 / 261
页数:7
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