Two-photon lithography for three-dimensional fabrication in micro/ nanoscale regime: A comprehensive review

被引:132
作者
Harinarayana, V. [1 ]
Shin, Y. C. [1 ]
机构
[1] Purdue Univ, Sch Mech Engn, Ctr Laserbased Mfg, W Lafayette, IN 47907 USA
关键词
Microfabrication; Nanofabrication; Resolution; Two-photon lithography; Nonlinear absorption; Metamaterials; NEGATIVE-INDEX; MECHANICAL METAMATERIALS; STIMULATED-EMISSION; METALLIC STRUCTURES; BEAM LITHOGRAPHY; LASER; POLYMERIZATION; RESOLUTION; MICROFABRICATION; NANOSTRUCTURES;
D O I
10.1016/j.optlastec.2021.107180
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
With the advent of femtosecond lasers in the early 1990s, ultrafast laser processing has proven to be an imperative tool for micro/nano machining. Two-photon lithography (TPL) is one such unique microfabrication technique exploiting the nonlinear dependency of the polymerization rate on the irradiating light intensity to produce true three-dimensional structures with feature sizes beyond the diffraction limit. This characteristic has revolutionized laser material processing for the fabrication of micro and nanostructures. In this paper, an overview of TPL including its working principle, experimental setup, and materials is presented. Then, the effect of resolution with a focus on techniques adopted to improve the final resolution of the structures is covered. Insights to improve throughput and speed of fabrication to pave a way for industrialization of this technique are provided. Finally, TPL for microfabrication of structures with the emphasis on metamaterials is thoroughly reviewed and presented.
引用
收藏
页数:25
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