Similarities and differences in sublimation growth of SiC and AlN

被引:69
作者
Epelbaum, B. M.
Bickermann, M.
Nagata, S.
Heimann, P.
Filip, O.
Winnacker, A.
机构
[1] Univ Erlangen Nurnberg, Dept Mat Sci 6, D-91058 Erlangen, Germany
[2] JFE Mineral Co Ltd, Res Labs, Funct Mat Dev Ctr, Chuou Ku, Chiba 2600826, Japan
关键词
growth from vapor; aluminum nitride; silicon carbide;
D O I
10.1016/j.jcrysgro.2007.04.008
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
The similarities and differences in development of crystal growth of bulk silicon carbide (SiC) and aluminum nitride (AIN) are discussed. It is concluded that AIN is going to become the second crystal grown in production scale using PVT technique. The growth technology of AIN may take advantage of learning from SiC technology as the latter is based on significant advances achieved in the course of last 20 years. The main differences between two materials are in incongruent evaporation of SiC and in poor compatibility of AIN with regular high-temperature crucible materials. (c) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:317 / 325
页数:9
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