Atomic scale mechanisms and brittle to ductile transition at low size in silicon

被引:2
作者
Brochard, Sandrine [1 ]
El Nabi, Firas Abed [1 ]
Pizzagalli, Laurent [1 ]
Merabet, Amina [2 ]
Texier, Michael [2 ]
Tromas, Christophe [1 ]
Godet, Julien [1 ]
机构
[1] Univ Poitiers, ISAE ENSMA, Dept Phys & Mecan Mat, UPR CNRS 3346,Inst Pprime, SP2MI,BP 30179, F-86962 Futuroscope, France
[2] Univ Aix Marseille, Univ Toulon, UMR CNRS 7334, IM2NP, F-13397 Marseille, France
关键词
brittle to ductile transition; silicon; nanowire; molecular dynamics simulations; dislocation; cavity; MOLECULAR-DYNAMICS SIMULATIONS; LARGE-STRAIN PLASTICITY; DISLOCATION NUCLEATION; INCIPIENT PLASTICITY; BENDING STRENGTH; ROOM-TEMPERATURE; SURFACE STEP; HIGH-STRESS; NANOWIRES; DEFORMATION;
D O I
10.1016/j.matpr.2018.03.059
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Molecular dynamics (MD) simulations of silicon nanowires (NW) tensile deformation were performed. They reveal a great variety of behaviors, which are rationalized thanks to a diagram highlighting the sequences of elementary mechanisms. In particular, MD simulations show that cavity formation inside the NW can occur through dislocations interactions. To quantify the brittle/ductile character of the NWs for each tested conditions, we define a ductility parameter which is extracted from the simulation output. Its variation suggests that the brittle to ductile transition (BDT) at low size is not sharp, conversely to the well-known BDT for bulk silicon. (C) 2017 Elsevier Ltd. All rights reserved.
引用
收藏
页码:14693 / 14704
页数:12
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