Evaluating the manufacturing capability of a lithographic area by using a novel vague GERT

被引：11

作者：

Wang, Chia-Nan ^{[2
]}

Yang, Gino K. ^{[3
]}

Hung, Kuo-Chen ^{[4
]}

Chang, Kuei-Hu ^{[1
]}

Chu, Peter ^{[5
]}

机构：

[1] ROC Mil Acad, Dept Management Sci, Kaohsiung 830, Taiwan

[2] Natl Kaohsiung Univ Appl Sci, Dept Ind Engn & Management, Kaohsiung 807, Taiwan

[3] Hungkuang Univ, Dept Comp Sci & Informat Management, Taichung 433, Taiwan

[4] Natl Def Univ, Dept Logist Management, Taipei 112, Taiwan

[5] Cent Police Univ, Dept Traff Sci, Tao Yuan 333, Taiwan

来源：

EXPERT SYSTEMS WITH APPLICATIONS | 2011年 / 38卷 / 01期

关键词：

Lithographic area; Graphical evaluation and review technique; Fuzzy sets; Vague sets; SETS; SIMULATION;

D O I：

10.1016/j.eswa.2010.07.074

中图分类号：

TP18 [人工智能理论];

学科分类号：

081104 ; 0812 ; 0835 ; 1405 ;

摘要：

This study proposes a novel vague graphical evaluation and review technique (GERT) for evaluating wafer manufacturing yield and finishing time in lithographic area. Wafer manufacturing reparability in lithographic area often requires reentry operations. Besides, many manufacturing steps, variable products, and flows can cause many difficulties and uncertainties. Hence, lithographic area is always the bottleneck in wafer fab manufacturing procedures. The main purpose of this study is to resolve the reentry problem in wafer manufacturing by GERT, and to solve the uncertainty problem by using vague set. Based on the manufacturing procedure of lithographic area in the 300 mm wafer fab, the algorithm steps for vague GERT are proposed, and a simple decision support system is developed to process the complex calculation procedure for providing more information to managers. We also hope to enhance the capability of lithographic area in order to improve overall system performance. (C) 2010 Elsevier Ltd. All rights reserved.

引用

页码：923 / 932

页数：10

共 12 条

[1]

ARISHA A, 2004, J MATER PROCESS TECH, P2071

[2] Multicriteria fuzzy decision-making problems based on vague set theory [J].

Hong, DH ;

Choi, CH .

FUZZY SETS AND SYSTEMS, 2000, 114 (01) :103-113

[3] An enhanced method and its application for fuzzy multi-criteria decision making based on vague sets [J].

Hung, Kuo-Chen ;

Yang, Gino K. ;

Chu, Peter ;

Jin, Warren Tsu-Huei .

COMPUTER-AIDED DESIGN, 2008, 40 (04) :447-454

[4] FUZZY NETWORK TECHNIQUE FOR TECHNOLOGICAL-FORECASTING [J].

ITAKURA, H ;

NISHIKAWA, Y .

FUZZY SETS AND SYSTEMS, 1984, 14 (02) :99-113

[5] Critical dimension control in photolithography based on the yield by a simulation program [J].

Kang, HY ;

Lee, AHI .

MICROELECTRONICS RELIABILITY, 2006, 46 (5-6) :1006-1012

[6] Optical lithography simulation for the whole resist process [J].

Kim, SK ;

Lee, JE ;

Park, SW ;

Oh, HK .

CURRENT APPLIED PHYSICS, 2006, 6 (01) :48-53

[7] Low-frequency and abnormal Raman spectrum in SnO2 nanorods [J].

Liu, YK ;

Dong, Y ;

Wang, GH .

CHINESE PHYSICS LETTERS, 2004, 21 (01) :156-159

[8] Design and analysis of phase gratings for laser beams coherent combination [J].

Luo, Boliang ;

Wang, Chengcheng ;

Du, Jinglei ;

Ma, Chi ;

Guo, Yongkang ;

Yao, Jun .

MICROELECTRONIC ENGINEERING, 2006, 83 (4-9) :1368-1371

[9]

Whitehouse G.E., 1973, SYSTEMS ANAL DESIGN

[10] Improved method of multicriteria fuzzy decision-making based on vague sets [J].

Ye, Jun .

COMPUTER-AIDED DESIGN, 2007, 39 (02) :164-169

← 1 2 →