Characterization of Cr-Ni multilayers electroplated from a chromium(III)-nickel(II) bath using pulse current

被引:31
作者
Huang, Ching An [1 ]
Chen, Chao Yu
Hsu, Chun Ching
Lin, Chao Sung
机构
[1] Chang Gung Univ, Dept Engn Mech, Tao Yuan, Taiwan
[2] Natl Taiwan Univ, Dept Mat Sci & Engn, Taipei, Taiwan
关键词
Cr-Ni multilayers; electroplating; microstructure; CITRATE ELECTROLYTE; ELECTRODEPOSITION; ALLOYS; COATINGS; BEHAVIOR; ACID;
D O I
10.1016/j.scriptamat.2007.02.004
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Cr-Ni multilayers with thickness modulation of several tens of nanometers were prepared by pulse-current electroplating from a Cr(III)-Ni(II) bath at 30 degrees C. The Cr-Ni multilayers were composed of alternate amorphous Cr-rich and nanocrystalline Ni-rich layers. This amorphous Cr-rich layer could be attributed to a reduction in the complex-formed Cr ion, which leads, to the presence of C, a glass-forming element, in the Cr-rich deposit during electrodeposition. Twins were found in the nanosized Ni-rich layer, in which stacking faults were frequently observed. (c) 2007 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
引用
收藏
页码:61 / 64
页数:4
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