EFFECT OF BTA DERIVATIVE ON REDUCTION OF GALVANIC CORROSION BETWEEN OF RU AND CU DURING CMP

被引：0

作者：

Zhang, JiaJie ^{[1
,2
]}

Zhou, Jianwei ^{[1
,2
]}

Wang, Chenwei ^{[1
,2
]}

Wang, Ziyan ^{[1
,2
]}

Wang, Qingwei ^{[1
,2
]}

机构：

[1] Hebei Univ Technol, Tianjin Key Lab Elect Mat & Devices, Tianjin 300130, Peoples R China

[2] Hebei Univ Technol, Sch Elect Informat Engn, Tianjin 300130, Peoples R China

来源：

2019 CHINA SEMICONDUCTOR TECHNOLOGY INTERNATIONAL CONFERENCE (CSTIC) | 2019年

关键词：

Ru; CMP; galvanic corrosion; TT-LYK; inhibitor;

D O I：

10.1109/cstic.2019.8755714

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

In this paper, a kind of BTA derivative 2,2'-[[(Methyl-1H-benzotriazol-1-yl)methyl]imino]bisthnol (TT-LYK) was used to reduce the galvanic corrosion between copper (Cu) and ruthenim (Ru) during chemical mechanical process (CMP). The effect of TT-LYK on the galvanic corrosion current (I-GC) of Ru and Cu in potassium periodate (KIO4) based slurry was investigated.The electrochemical experiment result show that the corrosion currents for Cu/Ru galvanic couple can be decreased in the presence of TT-LYK based on potassium periodate slolutions..

引用

页数：3

共 4 条

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