Source collection optics for EUV lithography

被引：5
作者：
Marczuk, P [1 ]
Egle, W [1 ]
机构：
[1] Carl Zeiss Laser Opt GmbH, D-73446 Oberkochen, Germany
来源：
ADVANCES IN MIRROR TECHNOLOGY FOR X-RAY, EUV LITHOGRAPHY, LASER, AND OTHER APPLICATIONS II | 2004年 / 5533卷
关键词：
D O I：
10.1117/12.549409
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
Next generation lithography is likely to deploy extreme UV (EUV) light at 13.5 nm wavelength for key manufacturing processes. Currently, all promising EUV light source concepts require efficient light collection optics in order to deliver sufficeintly high light power for profitable chip production. With densely nested Wolter-Type 1 reflective optics we designed, and fabricated such optics. In this paper we report on the latest achievements in design, development and on our first at wavelength testing results of such collection optics.
引用
收藏
页码：145 / 156
页数：12
相关论文
共 14 条
  • [1] Mirror system for the German X-ray satellite ADRIXAS:: Flight mirrors fabrication, integration and testing
    Altmann, J
    Egle, W
    Bingel, U
    Hafner, W
    Gänswein, B
    Schwarz, H
    Neugschwender, A
    Zeiss, C
    [J]. X-RAY OPTICS, INSTRUMENTS, AND MISSIONS, 1998, 3444 : 350 - 358
  • [2] [Anonymous], ELECTRONICS
  • [3] The status of the X-ray flight mirror production for the ESA XMM spacecraft
    deChambure, D
    Laine, R
    vanKatwijk, K
    vanCasteren, J
    Glaude, P
    [J]. EUX, X-RAY, AND GAMMA-RAY INSTRUMENTATION FOR ASTRONOMY VIII, 1997, 3114 : 113 - 124
  • [4] Collection efficiency of EUV sources
    Derra, G
    Singer, W
    [J]. EMERGING LITHOGRAPHIC TECHNOLOGIES VII, PTS 1 AND 2, 2003, 5037 : 728 - 741
  • [5] ABRIXAS mirror system: Mirror modules testing and integration in the ABRIXAS satellite
    Egle, W
    Altmann, J
    Schwarz, H
    [J]. X-RAY OPTICS, INSTRUMENTS, AND MISSIONS II, 1999, 3766 : 2 - 10
  • [6] Mirror system for the German X-ray satellite ABRIXAS:: Design and mirrors development
    Egle, W
    Altmann, J
    Kaufmann, P
    Münker, H
    Derst, G
    Schwarz, H
    Neugschwender, A
    Zeiss, C
    [J]. X-RAY OPTICS, INSTRUMENTS, AND MISSIONS, 1998, 3444 : 359 - 368
  • [7] EGLE W, 2003, P SOC PHOTO-OPT INS, V5193, P39, DOI DOI 10.1117/12.507736
  • [8] EGLE WJ, 2000, P SPIE, V4012
  • [9] FRIEDRICH P, 1999, P SOC PHOTO-OPT INS, V3444, P342
  • [10] HENKE BL, 1993, ATOM DATA NUCL DATA, V54, P2
12