Photoactivity passivation of TiO2 nanoparticles using molecular layer deposited (MLD) polymer films

被引：46
作者：
Liang, Xinhua [1 ]
Weimer, Alan W. [1 ]
机构：
[1] Univ Colorado, Dept Chem & Biol Engn, Boulder, CO 80309 USA
来源：
JOURNAL OF NANOPARTICLE RESEARCH | 2010年 / 12卷 / 01期
关键词：
TiO2; Photoactivity; Molecular layer deposition (MLD); Aluminum alkoxide (alucone); Pigments; TITANIUM-DIOXIDE PIGMENTS; FLUIDIZED-BED REACTOR; SOLID-STATE; PARTICLES; PHOTODEGRADATION; SPECTROSCOPY; POLYETHYLENE; ALD;
D O I：
10.1007/s11051-009-9587-0
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
Pigment-grade anatase TiO2 particles (160 nm) were passivated using ultra-thin insulating films deposited by molecular layer deposition (MLD). Trimethylaluminum (TMA) and ethylene glycol (E.G) were used as aluminum alkoxide (alucone) precursors in the temperature range of 100-160 degrees C. The growth rate varied from 0.5 nm/cycle at 100 degrees C to 0.35 nm/cycle at 160 degrees C. Methylene blue oxidation tests indicated that the photoactivity of pigment-grade TiO2 particles was quenched after 20 cycles of alucone MLD film, which was comparable to 70 cycles of Al2O3 film deposited by atomic layer deposition (ALD). Alucone films would decompose in the presence of water at room temperature and would form a more stable composite containing aluminum, which decreased the passivation effect on the photoactivity of TiO2 particles.
引用
收藏
页码：135 / 142
页数：8
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