Effects of substrate temperature on the growth of C60 polycrystalline films by physical vapor deposition

This work examines the growth Of C-60 polycrystalline films by physical vapor deposition in a vertical chamber. By varying the substrate temperature T-sub, the as-deposited films are grouped into four types, according to surface morphology, elucidated by scanning electron microscopy. X-ray diffraction is then used to determine the degree of crystallinity of the grains in these polycrystalline films. Moreover, the T-sub-dependence of the surface morphology and the growth rate of these films are described by using a model that involves adsorption, surface kinetics, and re-evaporation of the incoming molecules. Finally, the optimal position for vapor deposition is proposed by applying the concept of constitutional supersaturation. (C) 2002 Elsevier Science B.V. All rights reserved.