Comprehensive transmission electron microscopy study on Cu-Al intermetallic compound formation at wire bond interface

被引:4
作者
Bae, In-Tae [1 ]
Jung, Dae Young [1 ]
Chen, William T. [2 ]
Chen, Scott [2 ]
Chang, Jenny [2 ]
机构
[1] SUNY Binghamton, Small Scale Syst Integrat & Packaging Ctr, Binghamton, NY 13902 USA
[2] Adv Semicond Engn Inc, Sunnyvale, CA 94085 USA
关键词
COPPER WIRE; BEHAVIOR; GROWTH;
D O I
10.1557/jmr.2014.352
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Comprehensive intermetallic compound phase analysis at wire bond interfaces was performed for a side-by-side comparative study between 18 mu m Pd-only coated Cu wire and 18 mu m Pd-coated Cu wire followed by Au flash coating. Scanning electron microscopy and transmission electron microscopy results combined with nanobeam electron diffraction and structure factor calculation identified the formation of metastable theta'-CuAl2 and Cu9Al4 in both of the wire bonds before and after high temperature storage test. In particular, nanobeam electron diffraction and structure factor calculation unambiguously revealed that the two intermetallic compound phases grow in size after high storage temperature test in a manner that they maintain their epitaxial relationships that minimize lattice mismatch at the Cu/Al wire bond interface. Nanobeam electron diffraction and energy dispersive x-ray spectroscopy results found no significant Au flash coating effects in terms of intermetallic compound morphology, phase, and thermal evolution.
引用
收藏
页码:2787 / 2798
页数:12
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