Difference of deposition process of an amorphous carbon film due to source gases

被引：9

作者：

Shinohara, Masanori ^{[1
]}

Kawazoe, Hiroki ^{[1
]}

Inayoshi, Takanori ^{[1
]}

Kawakami, Taka-aki ^{[1
]}

Matsuda, Yoshinobu ^{[2
]}

Fujiyama, Hiroshi ^{[1
]}

Nitta, Yuki ^{[3
]}

Nakatani, Tatsuyuki ^{[3
]}

机构：

[1] Nagasaki Univ, Grad Sch Sci & Technol, Nagasaki 8528521, Japan

[2] Nagasaki Univ, Dept Elect & Elect Engn, Nagasaki 8528521, Japan

[3] Toyo Adv Technol Co Ltd, Ninami Ku, Hiroshima 7348501, Japan

来源：

THIN SOLID FILMS | 2010年 / 518卷 / 13期

关键词：

Infrared spectroscopy; Amorphous carbon; Acetylene; Methane; Plasma; INTERNAL-REFLECTION GEOMETRY; DIAMOND-LIKE CARBON; INFRARED-SPECTROSCOPY; HYDROGENATED CARBON; METHANE PLASMA; GLOW-DISCHARGES; SI SURFACE; GROWTH; EVOLUTION; COATINGS;

D O I：

10.1016/j.tsf.2009.11.033

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We compared the deposition process of an amorphous carbon film using acetylene as a source gas with the deposition process using methane. The process was investigated by using infrared absorption spectroscopy in multiple internal reflection geometry (MIR-IRAS). The infrared spectra showed that sp(3)-hydrocarbon species was observed in both cases: on the other hand, the sp- and sp(2)-carbon and/or hydrocarbon species was clearly observed in the film deposited using acetylene. Moreover, we observed the changes in predominant adsorbed species with film thickness in both cases; these facts suggest that an amorphous carbon film grows with the structural changes of adsorbed species in both deposition processes. (C) 2009 Elsevier B.V. All rights reserved.

引用

页码：3497 / 3501

页数：5

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