Mechanism of enhanced adhesion between hydrogenated amorphous carbon films and tungsten preimplanted steel substrates

被引:4
|
作者
Xu, Ming
Cai, Xun
Chen, Qiulong
Zhao, Jun
Chu, Paul K.
机构
[1] City Univ Hong Kong, Dept Phys & Mat Sci, Kowloon, Hong Kong, Peoples R China
[2] Shanghai Jiao Tong Univ, Sch Mat Sci & Engn, Shanghai 200030, Peoples R China
[3] SW Inst Phys, Chengdu 610041, Peoples R China
关键词
D O I
10.1063/1.2696471
中图分类号
O59 [应用物理学];
学科分类号
摘要
Hydrogenated amorphous carbon (a-C:H) films have good mechanical properties but poor adhesion on substrates such as tool steels thereby limiting their applications. Film adhesion can be improved by conducting tungsten preimplantation into the steel substrates before deposition of the carbon film. The enhancement mechanism is investigated in this study by depositing the films on W plasma-preimplanted (20 kV, 5x10(17) ions cm(-2)) and untreated steel substrates using mixed acetylene and argon plasmas with different flow rate ratios by means of plasma immersion ion implantation and deposition. Preimplantation creates a graded WC interface that mitigates diffusion of the dissociated carbon atoms on the surface. Compared to the films deposited on untreated steel substrates, the ones deposited on the W-implanted steel substrates exhibit improved adhesion strength, especially for the lower acetylene to argon flow rate ratios. Tungsten preimplantation is critical to the successful fabrication of a-C:H films on steel substrates. Furthermore, the flow rate ratio also has a large impact on the film properties due to the variations in the deposition rate causing different internal stress in the film. A nucleation model is proposed to explain the enhancement of the adhesion properties. (c) 2007 American Institute of Physics.
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页数:8
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