Laser micromachining of optical materials with a 157nm fluorine laser

被引：7

作者：

Greuters, J ^{[1
]}

Rizvi, NH ^{[1
]}

机构：

[1] Exitech Ltd, Oxford OX5 1QU, England

来源：

LASER MICROMACHINING FOR OPTOELECTRONIC DEVICE FABRICATION | 2003年 / 4941卷

关键词：

157nm laser; F-2 laser micromachining; photonics devices; silica; lithium niobate; indium phosphide;

D O I：

10.1117/12.468234

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Vacuum UV laser micromachining is used to produce rnicrostructures; in common photonics materials. The ablation etch rates of lithium niobate, fused silica and indium phosphide are measured at 157nm and angled facets and v-grooves are machined into the materials using a high NA mask projection system. The applicability of such micromachined structures for photonics devices is discussed and future developments outlined.

引用

页码：77 / 83

页数：7

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