Photocatalytic decomposition of NO under visible light irradiation on the Cr-ion-implanted TiO2 thin film photocatalyst

被引：159

作者：

Takeuchi, M

Yamashita, H

Matsuoka, M

Anpo, M

Hirao, T

Itoh, N

Iwamoto, N

机构：

[1] Osaka Prefecture Univ, Dept Appl Chem, Osaka 5998531, Japan

[2] Osaka Univ, Dept Elect Engn, Suita, Osaka 5650871, Japan

[3] Matsushita Elect Ind Co Ltd, Human Environm Syst Dev Ctr, Soura Ku, Kyoto 6190237, Japan

[4] Ion Engn Res Inst Corp, Osaka 5730128, Japan

来源：

CATALYSIS LETTERS | 2000年 / 67卷 / 2-4期

关键词：

TiO2 thin film photocatalyst; ionized cluster beam deposition method; ion implantation; visible light; decomposition reaction of NO;

D O I：

10.1023/A:1019065521567

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Transparent TiO2 thin film photocatalysts were prepared on transparent porous Vycor glass (PVG) by the ionized cluster beam (ICB) method. In order to improve the photocatalytic performance of these thin films under visible light irradiation, transition metal ions such as Cr and V were implanted into the deep bulk inside of the films using an advanced metal-ion-implantation technique. The UV-vis absorption spectra of these metal-ion-implanted TiO2 thin films were found to shift smoothly toward visible light regions, its extent depending on the amount and kinds of metal ions implanted. Using these metal-ion-implanted TiO2 thin films as photocatalysts, the photocatalytic decomposition of NOx into N-2 and O-2 was successfully carried out under visible light (lambda > 450 nm) irradiation at 275 K.

引用

页码：135 / 137

页数：3

共 11 条

[1] Design of unique titanium oxide photocatalysts by an advanced metal ion-implantation method and photocatalytic reactions under visible light irradiation [J].