Metal-semiconductor nanocontacts: Silicon nanowires

被引:178
作者
Landman, U [1 ]
Barnett, RN
Scherbakov, AG
Avouris, P
机构
[1] Georgia Inst Technol, Sch Phys, Atlanta, GA 30332 USA
[2] IBM Corp, Div Res, Thomas J Watson Res Ctr, Yorktown Heights, NY 10598 USA
关键词
D O I
10.1103/PhysRevLett.85.1958
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Silicon nanowires assembled from clusters or etched from the bulk, connected to aluminum electrodes and passivated, are studied with large-scale local-density-functional simulations. Shore (similar to 0.6 nm) wires are fully metallized by metal-induced gap states resulting in finite conductance (similar to e(2)/h). For longer wires (similar to 2.5 nm) nanoscale Schottky barriers develop with heights larger than the corresponding bulk value by 40% to 90%. Electric transport requires doping dependent gate voltages with the conductance spectra exhibiting interference resonances due to scattering of ballistic channels by the contacts.
引用
收藏
页码:1958 / 1961
页数:4
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