Synthesis of hexagonal and cubic GaN thin film on Si (111) using a low-cost electrochemical deposition technique

被引:19
作者
Al-Heuseen, K. [1 ]
Hashim, M. R. [1 ]
Ali, N. K. [1 ]
机构
[1] Univ Sains Malaysia, Sch Phys, George Town 11800, Malaysia
关键词
Deposition; Hexagonal GaN; Cubic GaN; Characterization methods; GALLIUM NITRIDE POWDERS; VAPOR-PHASE EPITAXY; EVAPORATION; AMMONIA; SI(111); LAYERS;
D O I
10.1016/j.matlet.2010.04.043
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Gallium nitride GaN thin films were deposited on Si (111) substrates using electrochemical deposition technique at 20 degrees C. SEM images and EDX results indicated that the growth of GaN films varies with the current density. XRD and Raman analyses showed the presence of hexagonal wurtzite and cubic zinc blende GaN phases with the crystallite size around 18-19 nm. Photoluminescence spectrum showed that the energy gaps of h-GaN/Si (111) and c-GaN/Si (111) were near 3.39 eV and 3.2 eV respectively at 300 K. Raman spectrum indicated the presence of mixed phonon modes of hexagonal and cubic GaN. (C) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码:1604 / 1606
页数:3
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