In-situ IR and RHEED observations of fcc-Fe epitaxial growth on Cu(100) in an atmosphere of carbon monoxide

被引：0

作者：

Wadayama, T ^{[1
]}

Yamashita, T ^{[1
]}

Tanimura, R ^{[1
]}

Sato, T ^{[1
]}

Monma, K ^{[1
]}

Hatta, A ^{[1
]}

机构：

[1] Tohoku Univ, Grad Sch Engn, Dept Mat Sci, Sendai, Miyagi 9808579, Japan

来源：

MATERIALS TRANSACTIONS | 2004年 / 45卷 / 07期

关键词：

face centered cubic-Fe; Cu(100); infrared reflection absorption spectroscopy; reflection high-energy electron diffraction; surfactant; carbon monoxide; molecular beam epitaxy;

D O I：

10.2320/matertrans.45.2478

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Infrared reflection absorption spectroscopy (IRRAS) and reflection high-energy electron diffraction (RHEED) have been applied to in-situ observations of fcc-Fe epitaxial growth on Cu(100) at room temperature under very low carbon monoxide (CO) pressures. Extended layer-by-layer growth of fcc-Fe is observed at a CO pressure of 2.7 x 10(-8) Pa. Nevertheless, no adsorbed CO was detected on the growing film surface. The layer-by-layer growth is hampered severely at a CO pressure higher than 1.3 x 10(-7) Pa. A small band that is attributable to CO adsorption appears in the IRRAS spectra taken in the early stages of deposition at 1.3 x 10(-6) Pa. These observations indicate that the dissociation of adsorbed CO on the growing film surface plays an important role in the promotion of the layer-by-layer film growth of fcc-Fe.

引用

页码：2478 / +

页数：5

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