Langmuir probe measurement of the bismuth plasma plume formed by an extreme-ultraviolet pulsed laser

被引：11

作者：

Pira, P. ^{[1
,2
]}

Burian, T. ^{[1
,2
]}

Kolpakova, A. ^{[1
]}

Tichy, M. ^{[1
]}

Kudrna, P. ^{[1
]}

Danis, S. ^{[1
]}

Juha, L. ^{[2
]}

Lancok, J. ^{[2
]}

Vysin, L. ^{[2
]}

Civis, S. ^{[3
]}

Zelinger, Z. ^{[3
]}

Kubat, P. ^{[3
]}

Wild, J. ^{[1
]}

机构：

[1] Charles Univ Prague, Fac Math & Phys, CR-18000 Prague 8, Czech Republic

[2] Acad Sci Czech Republic, Inst Phys, Vvi, Prague 18221 8, Czech Republic

[3] Acad Sci Czech Republic, J Heyrovsky Inst Phys Chem, Vvi, CR-18223 Prague 8, Czech Republic

来源：

JOURNAL OF PHYSICS D-APPLIED PHYSICS | 2014年 / 47卷 / 40期

关键词：

XUV laser; Langmuir probe; pulsed laser deposition; plasma plume; X-RAY LASER; THIN-FILMS; ELECTRON-TEMPERATURE; ABLATION; PARAMETERS; DEPOSITION;

D O I：

10.1088/0022-3727/47/40/405205

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Properties of the plasma plume produced on a bismuth (Bi) target irradiated by a focused extreme-ultraviolet (XUV) capillary-discharge laser beam were investigated. Langmuir probes were used in both single- and double-probe arrangements to determine the electron temperature and the electron density, providing values of 1-3 eV and similar to 10(13)-10(14)m(-3), respectively. Although the temperatures seem to be comparable with values obtained in ablation plasmas produced by conventional, long-wavelength lasers, the density is significantly lower. This finding indicates that the desorption-like phenomena are responsible for the plume formation rather than the ablation processes. A very thin Bi film was prepared on an MgO substrate by pulsed XUV laser deposition. The non-uniform, sub-monolayer character of the deposited bismuth film confirms the Langmuir probe's observation of the desorption-like erosion induced by the XUV laser on the primary Bi target.

引用

页数：6

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