The effect of processing parameters on the properties of Ga-doped ZnO thin films by RF magnetron sputtering

被引:32
作者
Shin, Seung Wook [1 ]
Sim, Kyu Ung [1 ]
Moon, Jong-Ha [1 ]
Kim, Jin Hyeok [1 ]
机构
[1] Chonnam Natl Univ, Dept Mat Sci & Engn, Kwangju 500757, South Korea
关键词
Transparent conducting oxide (TCO); Ga-doped ZnO (GZO); Processing parameters; RF magnetron sputtering; ZINC-OXIDE; SUBSTRATE-TEMPERATURE; ROOM-TEMPERATURE; TRANSPARENT; DEPOSITION; SAPPHIRE;
D O I
10.1016/j.cap.2009.11.060
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The 3 wt% Ga-doped ZnO (G70) thin films were prepared on glass substrates by RF magnetron sputtering with different processing parameters such as RF powers, substrate temperatures and Ar working pressures Crystallinity and electrical properties of GZO films were investigated The X-ray diffraction results showed that all the GZO films were grown as a hexagonal wurtzite phase with highly c-axis preferred out-of-plane orientation The electrical properties of GZO films were strongly related to processing parameters With increasing the processing parameter values. the electrical properties of GZO films were improved up to at 350 degrees C, 200 W and 6 mTorr, above that they became worse at 400 degrees C and 7 5 mTorr The film showed the lowest resistivity of 3 45 x 10(-4) Omega cm when the film was prepared in the optimized conditions of processing parameters of 350 degrees C, 6 mTorr, and 200W (C) 2009 Elsevier B.V. All rights reserved
引用
收藏
页码:S274 / S277
页数:4
相关论文
共 12 条
[1]   The structural and electrical properties of Ga-doped ZnO and Ga, B-codoped ZnO thin films: The effects of additional boron impurity [J].
Abduev, Aslan Kh. ;
Akhmedov, Akmed K. ;
Asvarov, Abil Sh. .
SOLAR ENERGY MATERIALS AND SOLAR CELLS, 2007, 91 (04) :258-260
[2]   Influence of the deposition pressure on the properties of transparent and conductive ZnO:Ga thin-film produced by r.f. sputtering at room temperature [J].
Assunçao, V ;
Fortunato, E ;
Marques, A ;
Aguas, H ;
Ferreira, I ;
Costa, MEV ;
Martins, R .
THIN SOLID FILMS, 2003, 427 (1-2) :401-405
[3]   HIGHLY CONDUCTIVE AND TRANSPARENT GA-DOPED EPITAXIAL ZNO FILMS ON SAPPHIRE BY CVD [J].
ATAEV, BM ;
BAGAMADOVA, AM ;
DJABRAILOV, AM ;
MAMEDOV, VV ;
RABADANOV, RA .
THIN SOLID FILMS, 1995, 260 (01) :19-20
[4]   Boron-doped zinc oxide thin films for large-area solar cells grown by metal organic chemical vapor deposition [J].
Chen, X. L. ;
Xu, B. H. ;
Xue, J. M. ;
Zhao, Y. ;
Wei, C. C. ;
Sun, J. ;
Wang, Y. ;
Zhang, X. D. ;
Geng, X. H. .
THIN SOLID FILMS, 2007, 515 (7-8) :3753-3759
[5]   Electrical and optical studies of ZnO:Ga thin films fabricated via the sol-gel technique [J].
Cheong, KY ;
Muti, N ;
Ramanan, SR .
THIN SOLID FILMS, 2002, 410 (1-2) :142-146
[6]   ZnO:Ga thin films produced by RF sputtering at room temperature:: Effect of the power density [J].
Fortunato, E ;
Assunçao, V ;
Marques, A ;
Gonçalves, A ;
Aguas, H ;
Pereira, L ;
Ferreira, I ;
Fernandes, FMB ;
Silva, RJC ;
Martins, R .
ADVANCED MATERIALS FORUM II, 2004, 455-456 :12-15
[7]   Growth and characterization of Ga-doped ZnO layers on a-plane sapphire substrates grown by molecular beam epitaxy [J].
Kato, H ;
Sano, M ;
Miyamoto, K ;
Yao, T .
JOURNAL OF CRYSTAL GROWTH, 2002, 237 :538-543
[8]   Modified Thornton model for magnetron sputtered zinc oxide:: film structure and etching behaviour [J].
Kluth, O ;
Schöpe, G ;
Hüpkes, J ;
Agashe, C ;
Müller, J ;
Rech, B .
THIN SOLID FILMS, 2003, 442 (1-2) :80-85
[9]   Substrate temperature dependence of the properties of Ga-doped ZnO films deposited by DC reactive magnetron sputtering [J].
Ma, Quan-Bao ;
Ye, Zhi-Zhen ;
He, Hai-Ping ;
Wang, Jing-Rul ;
Zhu, Li-Ping ;
Zhao, Bing-Hui .
VACUUM, 2007, 82 (01) :9-14
[10]   Structural, electrical, and optical properties of transparent conductive ZnO:Ga films prepared by DC reactive magnetron sputtering [J].
Ma, Quan-Bao ;
Ye, Zhi-Zhen ;
He, Hal-Ping ;
Hu, Shao-Hua ;
Wang, Jing-Rul ;
Zhu, Li-Ping ;
Zhang, Yin-Zhu ;
Zhao, Bing-Hui .
JOURNAL OF CRYSTAL GROWTH, 2007, 304 (01) :64-68