Formation of intermetallic compounds in the Cr-Al-Si ternary system

被引：19

作者：

Gupta, SP ^{[1
]}

机构：

[1] Indian Inst Technol, Dept Mat & Met Engn, Kanpur 208016, Uttar Pradesh, India

来源：

MATERIALS CHARACTERIZATION | 2004年 / 52卷 / 4-5期

关键词：

Cr-Al-Si system; intermetallics; microstructure;

D O I：

10.1016/j.matchar.2004.06.010

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The microstructure and composition of binary and ternary intermetallics have been studied in ternary diffusion couples of Cr and an Al-Si eutectic alloy. The ternary intermetallic alpha always formed in the liquid part of the diffusion couple as a dendritic structure. Two intermetallics compounds, CrSi2 and Cr5Si3, of the Cr-Si binary system have been observed. The CrSi2 intermetallic has a high solubility of up to 20 at.% Al and forms as faceted plates. A number of intermetallics, namely, CrAl7, Cr2Al11, CrAl4, Cr4Al9, Cr5Al8 and Cr2Al, of the Cr-Al system have been observed. The solubility of Si varies from as low as 0.8 at.% in Cr2Al to as high as 9 at.% in Cr4Al9. A schematic of the reaction scheme of the Cr-Al-Si system is presented. This has been based on the observed microstructure and composition of phases. (C) 2004 Elsevier Inc. All rights reserved.

引用

页码：355 / 370

页数：16

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