Photocatalytic performance of TiVOx/TiO2 thin films prepared by bipolar pulsed magnetron sputter deposition

被引：3

作者：

Weng, Ko-Wei ^{[1
]}

Han, Sheng ^{[2
]}

机构：

[1] Natl Quemoy Univ, Dept Elect Engn, 1 Daxue Rd, Kinmen 89250, Taiwan

[2] Natl Taichung Univ Sci & Technol, Ctr Gen Educ, 129 San Min Rd,Sect 3, Taichung 40401, Taiwan

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2017年 / 35卷 / 04期

关键词：

VANADIUM-DOPED TIO2; METHYLENE-BLUE; IRRADIATION; HYDROPHILICITY; DEGRADATION; OXIDE;

D O I：

10.1116/1.4993435

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

TiO2 films were formed by sputtering, and TiVOx films were deposited by bipolar pulsed magnetron sputtering with pure Ti and V metal targets. The sputtering of V on Ti oxide had little effect on the orientation of the TiO2 (01) plane of the specimen assemblies. The main varying parameter was the vanadium pulse power. Sputtered V is supposed to undergo resputtering, favoring a low deposition rate and small thickness. TiO2 films that were sputtered with a vanadium pulse power of 150W were most effective in the photocatalytic decomposition of methylene blue solution. (C) 2017 American Vacuum Society.

引用

页数：7

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