Rectifying filamentary resistive switching in ion-exfoliated LiNbO3 thin films

被引:40
作者
Pan, Xinqiang [1 ]
Shuai, Yao [1 ,2 ]
Wu, Chuangui [1 ,2 ]
Luo, Wenbo [1 ,2 ]
Sun, Xiangyu [1 ]
Zeng, Huizhong [1 ]
Zhou, Shengqiang [3 ]
Boettger, Roman [3 ]
Ou, Xin [4 ]
Mikolajick, Thomas [5 ,6 ]
Zhang, Wanli [1 ,2 ]
Schmidt, Heidemarie [7 ]
机构
[1] Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Peoples R China
[2] Univ Elect Sci & Technol China, Collaborat Innovat Ctr Elect Mat & Devices, Chengdu 610054, Peoples R China
[3] Helmholtz Zentrum Dresden Rossendorf, Inst Ion Beam Phys & Mat Res, Bautzner Landstr 400, D-01328 Dresden, Germany
[4] Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China
[5] Namlab gGmbH, Nothnitzer Str 64, D-01187 Dresden, Germany
[6] Tech Univ Dresden, Inst Semicond & Microsyst, Nothnitzer Str 64, D-01187 Dresden, Germany
[7] Tech Univ Chemnitz, Dept Mat Nanoelect, Fac Elect Engn & Informat Technol, D-09126 Chemnitz, Germany
基金
中国国家自然科学基金;
关键词
LITHIUM-NIOBATE; RESISTANCE; EVOLUTION; SRTIO3;
D O I
10.1063/1.4940372
中图分类号
O59 [应用物理学];
学科分类号
摘要
In this letter, we report the resistive switching properties of ion-exfoliated LiNbO3 thin films. After annealing in Ar or in vacuum, electro-forming has been observed on the thin films, and the oxygen gas bubbles can be eliminated by tuning the annealing conditions in order to prevent the destruction of top electrodes. The thin films show rectifying filamentary resistive switching after forming, which is interpreted by a simplified model that the local filament does not penetrate throughout the LiNbO3 thin film, resulting in asymmetric contact barriers at the two interfaces. The well controlled electro-forming step and the highly reproducible switching properties are attributed to the more homogeneous distribution of defects in single crystalline materials and the specific geometry of filament. (C) 2016 AIP Publishing LLC.
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页数:5
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共 41 条
[1]   Suppression of endurance degradation by utilizing oxygen plasma treatment in HfO2 resistive switching memory [J].
Chand, Umesh ;
Huang, Chun-Yang ;
Jieng, Jheng-Hong ;
Jang, Wen-Yueh ;
Lin, Chen-Hsi ;
Tseng, Tseung-Yuen .
APPLIED PHYSICS LETTERS, 2015, 106 (15)
[2]   Switching Kinetic of VCM-Based Memristor: Evolution and Positioning of Nanofilament [J].
Chen, Jui-Yuan ;
Huang, Chun-Wei ;
Chiu, Chung-Hua ;
Huang, Yu-Ting ;
Wu, Wen-Wei .
ADVANCED MATERIALS, 2015, 27 (34) :5028-+
[3]   Purely Electronic Switching with High Uniformity, Resistance Tunability, and Good Retention in Pt-Dispersed SiO2 Thin Films for ReRAM [J].
Choi, Byung Joon ;
Chen, Albert B. K. ;
Yang, Xiang ;
Chen, I-Wei .
ADVANCED MATERIALS, 2011, 23 (33) :3847-+
[4]   Interface structure and phase of epitaxial SrTiO3 (110) thin films grown directly on silicon -: art. no. 131908 [J].
Hao, JH ;
Gao, J ;
Wang, Z ;
Yu, DP .
APPLIED PHYSICS LETTERS, 2005, 87 (13) :1-3
[5]   Homogeneous barrier modulation of TaOx/TiO2 bilayers for ultra-high endurance three-dimensional storage-class memory [J].
Hsu, Chung-Wei ;
Wang, Yu-Fen ;
Wan, Chia-Chen ;
Wang, I-Ting ;
Chou, Chun-Tse ;
Lai, Wei-Li ;
Lee, Yao-Jen ;
Hou, Tuo-Hung .
NANOTECHNOLOGY, 2014, 25 (16)
[6]   Switching mechanism of double forming process phenomenon in ZrOx/HfOy bilayer resistive switching memory structure with large endurance [J].
Huang, Chun-Yang ;
Huang, Chung-Yu ;
Tsai, Tsung-Ling ;
Lin, Chun-An ;
Tseng, Tseung-Yuen .
APPLIED PHYSICS LETTERS, 2014, 104 (06)
[7]   Role of oxygen vacancies in Cr-doped SrTiO3 for resistance-change memory [J].
Janousch, Markus ;
Meijer, G. Ingmar ;
Staub, Urs ;
Delley, Bernard ;
Karg, Siegfried F. ;
Andreasson, Bjorn P. .
ADVANCED MATERIALS, 2007, 19 (17) :2232-+
[8]   Mechanism for bipolar switching in a Pt/TiO2/Pt resistive switching cell [J].
Jeong, Doo Seok ;
Schroeder, Herbert ;
Waser, Rainer .
PHYSICAL REVIEW B, 2009, 79 (19)
[9]   Characteristic electroforming behavior in Pt/TiO2/Pt resistive switching cells depending on atmosphere [J].
Jeong, Doo Seok ;
Schroeder, Herbert ;
Breuer, Uwe ;
Waser, Rainer .
JOURNAL OF APPLIED PHYSICS, 2008, 104 (12)
[10]   Dislocation impact on resistive switching in single-crystal SrTiO3 [J].
Kamaladasa, R. J. ;
Noman, M. ;
Chen, W. ;
Salvador, P. A. ;
Bain, J. A. ;
Skowronski, M. ;
Picard, Y. N. .
JOURNAL OF APPLIED PHYSICS, 2013, 113 (23)