TiO2 DLAR coatings for planar silicon solar cells

被引：40

作者：

Richards, BS ^{[1
]}

Rowlands, SF

Honsberg, CB

Cotter, JE

机构：

[1] Univ New S Wales, Ctr Photovolta Engn, Sydney, NSW 2052, Australia

[2] Univ Western Australia, Dept Elect & Elect Engn, Perth, WA 6907, Australia

来源：

PROGRESS IN PHOTOVOLTAICS | 2003年 / 11卷 / 01期

关键词：

double-layer; antireflection coating; DLAR; titanium dioxide; TiO2; silicon; multicrystalline; solar cells;

D O I：

10.1002/pip.474

中图分类号：

TE [石油、天然气工业]; TK [能源与动力工程];

学科分类号：

0807 ; 0820 ;

摘要：

In this paper we demonstrate that a double-layer anti-reflection (DLAR) coating can be fabricated using only titanium dioxide (TiO2). Two TiO2 thin films were deposited onto planar silicon wafers using a simple atmospheric pressure chemical vapour deposition (APCVD) system under different deposition conditions. Weighted average reflectances of 6.5% (measured) and 7.0% (calculated) were achieved for TiO2 DLAR coatings in air and under glass, respectively. An increase in the short-circuit current density of Delta J(sc) = 2.5 mA/cm(2) can be expectedfor an optimised TiO2 DLAR coating when compared with a commercial TiO2 single-layer anti-reflection coating. Copyright (C) 2003 John Wiley Sons, Ltd.

引用

页码：27 / 32

页数：6

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