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Current transport and barrier height evaluation in Ni/InAlN/GaN Schottky diodes
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Donoval, D.
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Slovak Tech Univ Bratislava, Dept Microelect, SK-81219 Bratislava, Slovakia Slovak Tech Univ Bratislava, Dept Microelect, SK-81219 Bratislava, Slovakia

Chvala, A.
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Slovak Tech Univ Bratislava, Dept Microelect, SK-81219 Bratislava, Slovakia Slovak Tech Univ Bratislava, Dept Microelect, SK-81219 Bratislava, Slovakia

Sramaty, R.
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Slovak Tech Univ Bratislava, Dept Microelect, SK-81219 Bratislava, Slovakia Slovak Tech Univ Bratislava, Dept Microelect, SK-81219 Bratislava, Slovakia

Kovac, J.
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Slovak Tech Univ Bratislava, Dept Microelect, SK-81219 Bratislava, Slovakia Slovak Tech Univ Bratislava, Dept Microelect, SK-81219 Bratislava, Slovakia

Carlin, J. -F.
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Ecole Polytech Fed Lausanne, IPEQ, CH-1015 Lausanne, Switzerland Slovak Tech Univ Bratislava, Dept Microelect, SK-81219 Bratislava, Slovakia

Grandjean, N.
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Ecole Polytech Fed Lausanne, IPEQ, CH-1015 Lausanne, Switzerland Slovak Tech Univ Bratislava, Dept Microelect, SK-81219 Bratislava, Slovakia

Pozzovivo, G.
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Vienna Univ Technol, Inst Solid State Elect, A-1040 Vienna, Austria Slovak Tech Univ Bratislava, Dept Microelect, SK-81219 Bratislava, Slovakia

Kuzmik, J.
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Vienna Univ Technol, Inst Solid State Elect, A-1040 Vienna, Austria
Slovak Acad Sci, Inst Elect Engn, SK-84104 Bratislava, Slovakia Slovak Tech Univ Bratislava, Dept Microelect, SK-81219 Bratislava, Slovakia

Pogany, D.
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Vienna Univ Technol, Inst Solid State Elect, A-1040 Vienna, Austria Slovak Tech Univ Bratislava, Dept Microelect, SK-81219 Bratislava, Slovakia

Strasser, G.
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Vienna Univ Technol, Inst Solid State Elect, A-1040 Vienna, Austria Slovak Tech Univ Bratislava, Dept Microelect, SK-81219 Bratislava, Slovakia

Kordos, P.
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Slovak Tech Univ Bratislava, Dept Microelect, SK-81219 Bratislava, Slovakia
Slovak Acad Sci, Inst Elect Engn, SK-84104 Bratislava, Slovakia Slovak Tech Univ Bratislava, Dept Microelect, SK-81219 Bratislava, Slovakia
机构:
[1] Slovak Tech Univ Bratislava, Dept Microelect, SK-81219 Bratislava, Slovakia
[2] Ecole Polytech Fed Lausanne, IPEQ, CH-1015 Lausanne, Switzerland
[3] Vienna Univ Technol, Inst Solid State Elect, A-1040 Vienna, Austria
[4] Slovak Acad Sci, Inst Elect Engn, SK-84104 Bratislava, Slovakia
关键词:
GAN;
D O I:
10.1063/1.3442486
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
The current-voltage characteristics of the Ni/InAlN/GaN Schottky diodes were measured at various temperatures in the range of 300-700 K. The experimental data were analyzed considering different current-transport mechanisms. From the analysis it follows that the tunneling current, which might be due to a multistep tunneling along dislocations, is the dominant component at all temperatures in the samples investigated. The barrier height of the Ni/InAlN/GaN Schottky diodes, evaluated from the thermionic emission current, shows a slightly negative temperature coefficient and its value at 300 K is >= 1.46 eV. This is significantly higher barrier height than reported before (<1 eV). This discrepancy follows from an incorrect evaluation using the intercept and slope of a measured characteristic without separation of the individual current components. (C) 2010 American Institute of Physics. [doi:10.1063/1.3442486]
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