Modeling material saturation effects in microholographic recording

被引：10
作者：
Nagy, Zs.
Koppa, P.
Ujhelyi, F.
Dietz, E.
Frohmann, S.
Orlic, S.
机构：
[1] Budapest Univ Technol & Econ, Dept Atom Phys, H-1111 Budapest, Hungary
[2] Berlin Univ Technol, Inst Opt P1, D-10623 Berlin, Germany
来源：
OPTICS EXPRESS | 2007年 / 15卷 / 04期
关键词：
D O I：
10.1364/OE.15.001732
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
Microholographic data storage system model is presented that includes non-linear and non-local behavior of the storage material for accurate simulation of the system and optimization of the writing process. For the description of the photopolymer material a diffusion based nonlocal material model is used. The diffusion equation is solved numerically and the modulation of the dielectric constant is calculated. Diffraction efficiency of simulated microholograms and measurements were compared, and they show good agreement. (c) 2007 Optical Society of America.
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收藏
页码：1732 / 1737
页数：6
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