The era of hyper-scaling in electronics

被引:512
作者
Salahuddin, Sayeef [1 ]
Ni, Kai [2 ]
Datta, Suman [2 ]
机构
[1] Univ Calif Berkeley, Berkeley, CA 94720 USA
[2] Univ Notre Dame, Notre Dame, IN 46556 USA
关键词
TUNNEL-FETS;
D O I
10.1038/s41928-018-0117-x
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In the past five decades, the semiconductor industry has gone through two distinct eras of scaling: the geometric (or classical) scaling era and the equivalent (or effective) scaling era. As transistor and memory features approach 10 nanometres, it is apparent that room for further scaling in the horizontal direction is running out. In addition, the rise of data abundant computing is exacerbating the interconnect bottleneck that exists in conventional computing architecture between the compute cores and the memory blocks. Here we argue that electronics is poised to enter a new, third era of scaling - hyper-scaling - in which resources are added when needed to meet the demands of data abundant workloads. This era will be driven by advances in beyond-Boltzmann transistors, embedded non-volatile memories, monolithic three-dimensional integration and heterogeneous integration techniques.
引用
收藏
页码:442 / 450
页数:9
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