Modeling of spin coating film transfer and hot pressing method in the new LSI fabrication process I - the film transfer process -

被引:0
作者
Taniguchi, T
Doi, M
机构
[1] Yamagata Univ, Dept Polymer Sci & Engn, Yonezawa, Yamagata 9928510, Japan
[2] Nagoya Univ, Dept Computat Sci & Engn, Nagoya, Aichi 4648603, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 2004年 / 43卷 / 10期
关键词
STP; low-k material; global planarization; gap filling;
D O I
10.1143/JJAP.43.6968
中图分类号
O59 [应用物理学];
学科分类号
摘要
In this paper, we describe the dynamics of the filling of spaces between interconnections with a polymeric liquid attached to a rigid plate via an elastic film when the rigid plate is pressed clown at a constant velocity. A set of model equations which can describe the filling process is proposed. By performing Simulations for typical interconnection configurations, it was found that the time required to a achieve the total planarization is controlled by two processes, namely, (i) the filling of spaces between interconnections and (ii) the flattening of the interface between the polymeric liquid and elastic film. It was found that the time necessary to achieve the flattening of the top surface of the liquid film becomes constant as the velocity of pressing the top rigid plate becomes larger.
引用
收藏
页码:6968 / 6973
页数:6
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