Variability in sub-100nm SRAM designs

被引:97
作者
Heald, R [1 ]
Wang, P [1 ]
机构
[1] Sun Microsyst Inc, Sunnyvale, CA USA
来源
ICCAD-2004: INTERNATIONAL CONFERENCE ON COMPUTER AIDED DESIGN, IEEE/ACM DIGEST OF TECHNICAL PAPERS | 2004年
关键词
D O I
10.1109/ICCAD.2004.1382599
中图分类号
TP3 [计算技术、计算机技术];
学科分类号
0812 ;
摘要
Many components of variability become larger percentage design factors with decreasing feature size. Hence, the small transistors in SRAM cells are particularly sensitive to these variations. The SRAM cell transistors in sub-100 nm designs may contain fewer than 100 channel dopant atoms. To achieve a robust design with such variability, one must enhance the normal static-noise-margin and write-trip-point analysis, often with Monte Carlo simulations using statistical transistor models including the process and mismatch fluctuations. Similar challenges exist for the sense amplifiers normally used with SRAM arrays. Except with very low speed designs, yield to speed can be substantially reduced by variations between nominally matched sense amplifier transistors as well as by the variability resulting in a very worst memory cell low read current. This also increases the hazards of delay timing with dummy paths and dummy cells and increases the need for at-speed testing prior to repair.
引用
收藏
页码:347 / 352
页数:6
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