Sectioning of multilayers to make a multilayer Laue lens

被引:35
作者
Kang, Hyon Chol
Stephenson, G. Brian
Liu, Chian
Conley, Ray
Khachatryan, Ruben
Wieczorek, Michael
Macrander, Albert T.
Yan, Hanfei
Maser, Jorg
Hiller, Jon
Koritala, Rachel
机构
[1] Argonne Natl Lab, Ctr Nanoscale Mat, Argonne, IL 60439 USA
[2] Argonne Natl Lab, Div Mat Sci, Argonne, IL 60439 USA
[3] Argonne Natl Lab, Xray Sci Div, Argonne, IL 60439 USA
关键词
X-RAY OPTICS; RESOLUTION;
D O I
10.1063/1.2713439
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
We report a process to fabricate multilayer Laue lenses (MLL's) by sectioning and thinning multilayer films. This method can produce a linear zone plate structure with a very large ratio of zone depth to width (e.g., > 1000), orders of magnitude larger than can be attained with photolithography. Consequently, MLL's are advantageous for efficient nanofocusing of hard x rays. MLL structures prepared by the technique reported here have been tested at an x-ray energy of 19.5 keV, and a diffraction-limited performance was observed. The present article reports the fabrication techniques that were used to make the MLL's. (c) 2007 American Institute of Physics.
引用
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页数:3
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