A direct measure of the barrier to interlayer diffusion

被引：0
|
作者：
Roos, KR [1 ]
Tringides, MC [1 ]
机构：
[1] Bradley Univ, Dept Phys, Peoria, IL 61625 USA
来源：
SURFACE DIFFUSION: ATOMISTIC AND COLLECTIVE PROCESSES | 1997年 / 360卷
关键词：
D O I：
暂无
中图分类号：
O64 [物理化学（理论化学）、化学物理学]; O56 [分子物理学、原子物理学];
学科分类号：
070203 ; 070304 ; 081704 ; 1406 ;
摘要：
We use Monte Carlo simulations to study interlayer diffusion during submonolayer epitaxial growth in systems where the ratio of the terrace diffusion coefficient to deposition flux D/F is very high, and propose a method for directly measuring the barrier to interlayer diffusion from real experimental diffraction data.
引用
收藏
页码：219 / 225
页数：7
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