MCVD planar substrates for UV-written waveguide devices

被引：12

作者：

Webb, A. S. ^{[1
]}

Adikan, Er. Mahamd ^{[1
]}

Sahu, J. K. ^{[1
]}

Standish, R. J. ^{[1
]}

Gawith, C. B. E. ^{[1
]}

Gates, J. C. ^{[1
]}

Smith, P. G. R. ^{[1
]}

Payne, D. N. ^{[1
]}

机构：

[1] Univ Southampton, Optoelect Res Ctr, Southampton SO17 1BJ, Hants, England

来源：

ELECTRONICS LETTERS | 2007年 / 43卷 / 09期

关键词：

D O I：

10.1049/el:20070281

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A method for fabricating planar silica substrates via modified chemical vapour deposition (MCVD) and a modified fibre drawing technique is presented. Long lengths of planar material are generated from a single substrate offering a potentially low-cost alternative to existing planar substrate deposition processes. Buried straight and splitting waveguide channels, as well as Bragg gratings, are inscribed in the planar material using direct UV-writing technology, and the results are reported.

引用

页码：517 / 519

页数：3

共 5 条

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