Hall and field-effect mobilities of electrons accumulated at a lattice-matched ZnO/ScAIMgO4 heterointerface

被引:33
作者
Suzuki, TI
Ohtomo, A
Tsukazaki, A
Sato, F
Nishii, J
Ohno, H
Kawasaki, M
机构
[1] Tohoku Univ, Inst Mat Res, Aoba Ku, Sendai, Miyagi 9808577, Japan
[2] Tohoku Univ, Inst Multidisciplinary Res Adv Mat, Aoba Ku, Sendai, Miyagi 9808577, Japan
[3] Tohoku Univ, Elect Commun Res Inst, Aoba Ku, Sendai, Miyagi 9808577, Japan
关键词
D O I
10.1002/adma.200401018
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
At a lattice-matched ZnO/ScAIMgO(4) heterointerface, Hall and field-effect mobilities of grain-boundary-free ZnO channels have been simultaneously characterized under a gate electric field (E-G) applied through a ScAIMGO(4) dielectric gate. The field-effect mobility increased linearly with increasing EG (see Figure), clearly in contrast to the supralinear (exponential) dependence that has been previously reported for polycrystalline channels.
引用
收藏
页码:1887 / +
页数:5
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