Growth by molecular beam epitaxy and electrical characterization of GaAs nanowires

被引:65
|
作者
Piccin, M.
Bais, G.
Grillo, V.
Jabeen, F.
De Franceschi, S.
Carlino, E.
Lazzarino, M.
Romanato, F.
Businaro, L.
Rubini, S.
Martelli, F.
Franciosi, A.
机构
[1] CNR, INFM, TASC, Lab Nazl, I-34012 Trieste, Italy
[2] Univ Trieste, Ctr Excellence Nanostruct Mat, I-34127 Trieste, Italy
来源
PHYSICA E-LOW-DIMENSIONAL SYSTEMS & NANOSTRUCTURES | 2007年 / 37卷 / 1-2期
关键词
GaAs; nanowires; molecular beam epitaxy; electron microscopy; electronic transport;
D O I
10.1016/j.physe.2006.07.002
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We report on structural and electrical properties of GaAs nanowires (NWs) grown by molecular beam epitaxy (MBE) on GaAs and SiO2 substrates using Au as growth catalyst. Au-Ga particles are observed on the top of the NWs by transmission electron microscopy (TEM). In most of the observed cases, individual particles contain two Au-Ga compositions, in particular orthorhombic AuGa and beta' hexagonal Au7Ga2. The wires grown on GaAs are regularly shaped and tidily oriented on both (1 0 0) and (1 1 1)B substrates. TEM also reveals that the NWs have a wurtzite lattice structure. Electrical transport measurements indicate that nominally undoped NWs are weakly n-type while both Be- and Si-doped wires show p-type behaviour. The effect of the lattice structure on impurity incorporation is briefly discussed. (C) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:134 / 137
页数:4
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